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Preparation of Silicon Nitride with Good Interface Properties by Homogeneous Chemical Vapour Deposition.
Preparation of Silicon Nitride with Good Interface Properties by Homogeneous Chemical Vapour Deposition.
1990
B A Scott
J M Martinez Duart
D. B. Beach
T.N. Nguyen
R. D. Estes
R. G. Schad
Keywords:
Chemical vapor deposition
Silicon nitride
Homogeneous
Metalorganic vapour phase epitaxy
Organic chemistry
Inorganic chemistry
Chemistry
Nitride
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