Metal alkoxide compounds, thin film-forming raw material, manufacturing method, and an alcohol compound of the thin film
2013
The present invention, metal alkoxide compounds having suitable physical properties as a material for a thin film formed by CVD, in particular, there is provided a metal alkoxide compounds having suitable properties as a metallic copper thin film-forming raw material, specifically, there is provided a thin film-forming material comprising a metal alkoxide compound represented by the following general formula (I) and the metal alkoxide compound. (Wherein, R
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