Method for electroless deposition of nano metalic silver and plate deposited by nano metalic silver using the same

PURPOSE: An electroless deposition method of nano metallic silver, and a substrate deposited with nano metallic silver thereby are provided to form a silver screen layer in which metallic silver of a nano-size is deposited. CONSTITUTION: An electroless deposition method of nano metallic silver is as follows: Colloidal silver which comprises ionic silver, and reduction solution which comprises a reducing agent for colloidal silver are prepared. The prepared colloidal silver and the reduction solution are sprayed to a certain space separated from a substrate. The temperature of the colloidal silver and the reduction solution is 20°C to 27°C. The spraying angle of the colloidal silver and the reduction solution is 0° to 90°. And the spraying speed of the colloidal silver and the reduction solution is 100ml/min to 300ml/min.