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Strained-SOI/SGOI Dual Channel CMOS Technology Based on Ge Condensation Technique
Strained-SOI/SGOI Dual Channel CMOS Technology Based on Ge Condensation Technique
2006
Tezuka
Nakaharai
Moriyama
Hirashita
Toyoda
Numata
Irisawa
Usuda
Sugiyama
Mizuno
Takagi
Keywords:
Materials science
Communication channel
Condensation
Silicon
Electron mobility
Optoelectronics
Germanium
Silicon on insulator
MOSFET
CMOS
Correction
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