On the real structure of monocrystalline silicon near dislocation slip planes
1981
The properties of regions swept by a moving dislocation in silicon crystals are experimentally studied. The peculiarities of forming traces of various types behind dislocations observed by electron microscopy and chemical etching are investigated. These traces are found to arise as result of point defect redistribution by moving dislocations and change in their structural state in a volume swept by a dislocation. It is shown that the processes mentioned enable the slip plane to assume properties of a specific two-dimensional defect responsible for the appearance of the new mechanism of a charge carrier mobility anisotropy in the plastically deformed crystals.
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