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High energy excimer laser system for nanosecond annealing of semiconductor devices
High energy excimer laser system for nanosecond annealing of semiconductor devices
2019
Herve Besaucele
Laurent Ruet
Audrey Adnet
François Beau
Cedric Bellier
Paul Ceccato
Maxime Chatelain
Nabil Douri
Herve Dusserre
Cyril Dutems
Martin Heintzmann
K. Huet
Fulvio Mazzamuto
Antoine Melin
Sylvain Perrot
Olivier Sannier
Guillaume Thebault
I. Toque-Tresonne
Karim Zekri
Armand Verstraete
Bobby Lespinasse
Yacine Bouksou
Vincent Martinez
Mathiew Lenormand
David Rodrigues
Keywords:
Nanosecond
Excimer laser
Annealing (metallurgy)
Semiconductor device
Optoelectronics
Materials science
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