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High-k Materials for Tunnel Barrier Engineering in Floating-Gate Flash Memories
High-k Materials for Tunnel Barrier Engineering in Floating-Gate Flash Memories
2006
Pieter Blomme
Bogdan Govoreanu
Maarten Rosmeulen
A. Akheyar
Luc Haspeslagh
Joeri De Vos
Martino Lorenzini
Jan Van Houdt
Kristin De Meyer
Keywords:
High-κ dielectric
Electronic engineering
Materials science
Optoelectronics
tunnel barrier
Correction
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