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Plasmaless etching of silicon carbide using chlorine based gas
Plasmaless etching of silicon carbide using chlorine based gas
2012
Hatayama Tomoaki
Hori Ryouta
Tamura Tetsuya
Yano Hiroshi
Fuyuki Takashi
Keywords:
Oxygen
Silicon carbide
Etching
Inorganic chemistry
Dislocation
Chlorine
Materials science
Metallurgy
Correction
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