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Helium-charged aluminum and silicon films deposited by Direct Current Magnetron Sputtering
Helium-charged aluminum and silicon films deposited by Direct Current Magnetron Sputtering
2021
Sara Ibrahim
Pascal Brault
Amaël Caillard
Thierry Sauvage
Pierre Desgardin
M.-F. Barthe
Dirk Hufschmidt
Asunción Fernández
A Thomann
Keywords:
Optoelectronics
Aluminium
direct current magnetron sputtering
Helium
Materials science
Silicon
Correction
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