Numerical simulation of atomic deposition in the atom lithography

The experimental researches on atom lithography got a rapid development these years and have made a series of significant progress.The research of the processes of atomic deposition using different atoms in various conditions has an important significance.The finite-differences approximation is used to solve a Schrodinger equation describing the atom-laser field interactions.The effect of laser power,detuning,waist radius and longitudinal velocity of atoms to focusing are analyzed.The effects by some parameter to the atoms in a laser standing wave field are got.