Optical properties and structure of porous silicon

spectroscopy. The HF post-anodization treatment was used to modify the PS stmcture and properties.It is found that there is a transparent film with a sharp interface above the PS layer on the samples that show an intensephotolurninescence. The transparent surthce layer thickness as well as the refraction indices ofthis layer and PS layer below ithave been determined. The volume fractions ofthe oxide and silicon in the surface and lower PS layers have been eslimatedusing the Lorentz-Lorentz and Maxwell-Garnet formulas.Keywords: porous silicon photoluniinescence, post-anodization treatment, reflectance, refraction indices