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Impact of 193nm Resist Shrinkage on CD-SEM Metrology
Impact of 193nm Resist Shrinkage on CD-SEM Metrology
2001
Thomas Hoffmann
G. Storms
Monique Ercken
Mireille Maenhoudt
Ivan Pollentier
Kurt G. Ronse
F. Felten
E. Wong
Jonathan Gerald England
Keywords:
Metrology
Composite material
Resist
Materials science
Shrinkage
Correction
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