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Phase measurements of EUV mask defects
Phase measurements of EUV mask defects
2015
Rene A. Claus
Yow-Gwo Wang
Antoine Wojdyla
Markus P. Benk
Kenneth A. Goldberg
Andrew R. Neureuther
Patrick P. Naulleau
Laura Waller
Keywords:
Extreme ultraviolet lithography
Optics
Materials science
Correction
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