LPP source system development for HVM
2009
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light sources to
support optical imaging of circuit features at sub-22nm nodes on the ITRS roadmap. This paper provides a review of
development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals
targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume
Manufacturing (HVM) sources in production and at a leading semiconductor device manufacturer is discussed. The
EUV power at intermediate focus is discussed and the lastest data are presented. An electricity consumption model is
described, and our current product roadmap is shown.
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