Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane

Room temperature nanoimprint lithography (RT-NIL) is a simpler process than thermal and UV NIL because it can be carried out without a resist thermal cycle and UV exposure. A fluorinated self-assembled monolayer (F-SAM) is mainly used as an antisticking layer. However, the F-SAM deteriorates due to repeated nanoimprinting. To prevent the F-SAM coating on the NIL mold from deteriorating, we propose a new imprinting technique using release-agent spray-coated hydrogen silsesquioxane (RASC-HSQ). We carried out RT-NIL onto it using a mold without F-SAM. The pattern was successfully imprinted on the resin without any signs of adhesion.