Surface-initiated polymerization on self-assembled monolayers: amplification of patterns on the micrometer and nanometer scale

. The layer thickness was adjusted through the amountofsilaneprecursorandthereactiontime.Subsequentpumpingonthereaction chamber at 0.01hPa assisted in removing side products aswellasgivingahighlycondensedsilicanetwork.Theorganictemplatewas removed by calcination at 5008C in air. As known from earlierstudies of the deposition on silicon wafers, silane can be replaced bythe less pyrophoric methylsilane to give silica containing only a verysmall amountof organic groups.