Application of Mie theory and fractal models to determine the optical and surface roughness of Ag–Cu thin films

Thin films of Ag/Cu were deposited by reactive DC magnetron sputtering on (001)-oriented Si and glass substrates for various deposition times (4–24 min). These films were characterized by atomic force microscopy (AFM), and a power law scaling was performed on the obtained micrographs to investigate the self-affine nature of the sample morphology, which is indicative of a fractal structure. We applied the Higuchi’s algorithm to the AFM data to determine the fractal dimension of each sample, and the Hurst exponents were computed. The deposition time dependences of these parameters and the grain size distributions estimated from the UV–visible spectra using the Mie theory, allowed us to describe a particle formation mechanism during the deposition process, in which the length of continuous paths of conductive particles increases as the deposition time is increased. In agreement with this explanation, the electrical resistance decreased with the increment of the deposition time.