Photocatalytic oxidation of NO on reduction type semiconductor photocatalysts: effect of metallic Bi on CdS nanorods

We report the first visible light photocatalytic oxidation of NO on CdS nanorods (CdS-NRs), one of the typical reduction type semiconductor photocatalysts. The NO removal rate in a continuous reactor sharply increases from 44% to 58% after in situ deposition of Bi nanoplates on CdS-NRs. The LSPR effect of metallic Bi causes the dramatic production of superoxide radicals (˙O2-) and singlet oxygen (1O2) that are responsible for the oxidation of NO.