Transparent conductive multilayer film and method for producing same

This transparent conductive multilayer film (100) sequentially comprises, on at least one surface of a film base (10), a transparent dielectric layer (21) and a transparent conductive film (24) that is provided in contact with the transparent dielectric layer (21), in this order. The transparent dielectric layer (21), which is in contact with the transparent conductive film (24), is a silicon oxide layer. The transparent conductive film (24) is a multilayer film that sequentially has, from the transparent film base (10) side, a first transparent conductive film (22) that is composed of an indium tin oxide layer that has a tin oxide content of 1% by weight of more but less than 6% by weight and a second transparent conductive film (23) that is composed of an indium tin oxide layer that has a tin oxide content of 6-20% by weight (inclusive). The film thickness (d 1 ) of the first transparent conductive film (22) and the film thickness (d 2 ) of the second transparent conductive film (23) satisfy the following relations (1)-(3): (1) d 1 = 1-9 nm; (2) d 1 + d 2 = 15-37 nm; and (3) 2d 1 < d 2 .