Reduction of MDP time through the improvement of verification method
2006
The low-k1 lithography produces large volumes of mask data resulting in more complex optical proximity effect. It
puts heavy burden on MDP flow and affects turn around time (TAT). To solve this problem, DP (Distributed Processing) method has been introduced. Even though DP is a very powerful tool to reduce the MDP time, there still might be
unexpected pattern drop issue. In order to deal with this issue, the verification step was added in MDP flow. The present
verification method is a boolean operation using 2 machine data after converting as a same way. However this
verification method has two shortcomings. First, this method is not suitable to detect the same error caused by same
software bug. Secondly, it needs double conversion time. A new verification method should be much faster and more
accurate than the current verification method. In this paper, the new verification method will be discussed and
experimental results using the new verification method will be shown with comparing to the old verification method.
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