Substrate holder CVD reactor lies with having a plurality of zones on a gas cushion

The invention relates to a CVD reactor having at least one of a substrate holder carrier (1) on a dynamic gas cushion (19) carried by the substrate holder (2) which can be heated from the back side with a heater (30). This allows producing a convex or concave temperature profile on the substrate holder surface, it is proposed that the gas cushion (19) comprises a plurality of adjacent zones (A, C) which are of individual gas supply lines (7, 8) supplied.