硬 X 線光電子分光法による素子薄膜のバルク敏感電子状態評価

Hard X-ray photoemission spectroscopy (HXPS) with high-resolution, high-throughput and large photoelectron attenuation length has been developed at SPring-8 utilizing high brilliant undulator X-rays. This enhanced versatility of the photoemission spectroscopy, enabling to apply to laboratory prepared thin films and nano-structured samples of advanced materials. We will introduce wide varieties of experimental results on advance materials performed at JASRI public beamline BL47XU and NIMS contract beamline BL15XU of SPring-8.