Smooth, low-damage, definition of InGaAlAs asymmetric Fabry-Perot optical transmission modulators by Cl{sub 2}+Ar reactive-ion-beam etching

Chlorine-argon-based reactive-ion-beam etching was used successfully to etch novel InGaAlAs (1.32 {mu}m-wavelength Fabry-Perot resonator transmission) modulators. Resulting etch is very smooth, anisotropic, and has low etch-induced (sidewall) damage. Use of this simple chemistry eliminates difficulties with polymer formation encountered in hydrocarbon-based etches.