Magnetron sputtering film coating machine

The invention relates to a magnetron sputtering film coating machine which comprises a substrate inlet chamber, two or more coating chambers, a transitional chamber, a substrate outlet chamber and a substrate rack, wherein the transitional chamber comprises a feed end and a discharge end; the substrate inlet chamber is connected to the feed end of the transitional chamber, so as to send the substrate rack to the transitional chamber; the substrate outlet chamber is connected to the discharge end of the transitional chamber to receive the substrate rack sent by the transitional chamber; each coating chamber is communicated with the transitional chamber; the transitional chamber is used for switching the substrate rack among the coating chambers, so that each coating chamber can conduct coating on a substrate on the substrate rack. As the transitional chamber is communicated with the two or more coating chambers, and is fully used for transition, coating operation of various film materials can be carried out continuously on one film coating machine. Therefore, the productive tempo and production efficiency are improved, and the production cost is reduced.