Old Web
English
Sign In
Acemap
>
Paper
>
Understanding the behaviors of Cu during a post-gate-oxidation device process by using an isotope tracking analysis
Understanding the behaviors of Cu during a post-gate-oxidation device process by using an isotope tracking analysis
2006
Sung-Wook Lee
Young-Hun Kim
Kwang-Salk Kim
Byungseop Hong
Bo-Young Lee
Keywords:
Physics
Nuclear magnetic resonance
Analytical chemistry
Silicon dioxide
Wafer
Isotope
Condensed matter physics
Getter
Optoelectronics
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
5
Citations
NaN
KQI
[]