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Extending PVD copper barrier process beyond 65nm technology
Extending PVD copper barrier process beyond 65nm technology
2006
Paul S. Ho
Umesh Kelkar
Arvind Sundarrajan
Jennifer Tseng
Suketu A. Parikh
Tza-Jing Gung
Ned Hammond
Xinyu Fu
Ajay Bhatnagar
John C. Forster
Michael D. Armacost
Prabu Gopalraja
Jianming Fu
Jick M. Yu
Keywords:
Copper
Materials science
Metallurgy
Correction
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