Quantum correction for DG MOSFETs

The characteristics of modern semiconductor devices are strongly influenced by quantum mechanical effects. Due to this fact, purely classical device simulation is not sufficient to accurately reproduce the device behavior. For instance, the classical semiconductor equations have to be adapted to account for the quantum mechanical decrease of the carrier concentration near the gate oxide. Several available quantum correction models are derived for devices with one single inversion layer and are therefore only of limited use for thin double gate (DG) MOSFETs where the two inversion layers interact. We present a highly accurate quantum correction model which is even valid for extremely scaled DG MOSFET devices. Our quantum correction model is physically based on the bound states that form in the Si film. The eigenenergies and expansion coefficients of the wave functions are tabulated for arbitrary parabolic approximations of the potential in the quantum well. Highly efficient simulation of DG MOSFET devices scaled in the decananometer regime in TCAD applications is made possible by this model.