Positron annihilation studies of diamondlike nanocomposite films

Positron annihilation spectroscopy (PAS) as a nondestructive, depth‐sensitive probe was applied to study diamondlike nanocomposite (DLN) films. DLN films were deposited from a plasma discharge of polyphenilmetilsiloxane on rf‐biased Si substrates. The film properties show systematic changes with variations in the voltage applied to the substrate. The film deposited at an rf bias voltage of 1000 V is stable under a 450 °C anneal. PAS results show that films with the highest breakdown voltage have the highest open‐volume regions. Ellipsometric measurements and Raman scattering results from these films are also provided.