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Etch Behavior of ALD Al2O3 on HfSiO and HfSiON Stacks in Acidic and Basic Etchants
Etch Behavior of ALD Al2O3 on HfSiO and HfSiON Stacks in Acidic and Basic Etchants
2011
Jisook Oh
Jihyun Myoung
Jin Sung Bae
Sangwoo Lim
Keywords:
Inorganic chemistry
Chemistry
Stack (abstract data type)
Chemical engineering
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