Patterning of functional materials in line with photosensitive template geometry
2020
A photosensitive template for patterning a functional material was developed. The template comprised an alkaline developable fluorinated copolymer and a diazonaphthoquinone. Ghi-line exposure and subsequent development using a diluted tetramethylammonium hydroxide solution yielded the micro-scale patterned template. A polysilane was patterned successfully using the template. The method was also applicable to yield patterns of RGB dyes and titanium oxide based white pigment.
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