Patterning of functional materials in line with photosensitive template geometry

A photosensitive template for patterning a functional material was developed. The template comprised an alkaline developable fluorinated copolymer and a diazonaphthoquinone. Ghi-line exposure and subsequent development using a diluted tetramethylammonium hydroxide solution yielded the micro-scale patterned template. A polysilane was patterned successfully using the template. The method was also applicable to yield patterns of RGB dyes and titanium oxide based white pigment.