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Deposition of Polycrystalline Silicon by Rapid Thermal CVD and Its Application to Direct Contact to TiSi2
Deposition of Polycrystalline Silicon by Rapid Thermal CVD and Its Application to Direct Contact to TiSi2
1991
Takehisa Yamaguchi
H. Itoh
T Katayama
Katsuhiro Tsukamoto
Yoichi Akasaka
Keywords:
Polycrystalline silicon
Thermal
Nanotechnology
Metallurgy
Materials science
Deposition (law)
thermal cvd
Correction
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