Current limiting ring device with shielding plate and chemical vapor deposition equipment and regulating method thereof

The invention provides a current limiting ring device with a shielding plate and chemical vapor deposition equipment and a regulating method thereof, the shielding plate prepared from a heat resistant material is arranged between the inner side of a current limiting ring and the outer side of a tray, the whole or part of the inner surface of the current limiting ring is shielded by the shielding plate so as to prevent heat radiation from the heated tray to the cooled current limiting ring, and by the shielding plate, or combination of the shielding plate and the tray, or combination of the shielding plate and the current limiting ring, a space for circulation of a process gas in a reaction cavity is formed, wherein the process gas is used for guiding the chemical vapor deposition process. The high heat radiation from the tray can be blocked by the shielding plate arranged on the inner side of the current limiting ring, by-product deposition can be inhibited, power consumption is reduced, and the temperature field and flow field in the reaction cavity can be adjusted, and the treatment effect of reaction process can be effectively improved.