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Effects of plasma enhanced chemical vapor deposition radio frequency on the properties of SiNx: H films
Effects of plasma enhanced chemical vapor deposition radio frequency on the properties of SiNx: H films
2017
Kyung Dong Lee
Kwang Sun Ji
Soohyun Bae
Seongtak Kim
Hyunho Kim
Jae Eun Kim
Yoon Chung Nam
Sung-jin Choi
Myeong Sang Jeong
Min Gu Kang
Hee Eun Song
Yoon Mook Kang
Hae Seok Lee
Donghwan Kim
Keywords:
Ion plating
Silicon nitride
Thin film
Hybrid physical-chemical vapor deposition
Inorganic chemistry
Plasma processing
Materials science
Passivation
Combustion chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Chemical engineering
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