Organotin in Non-Chemically Amplified Polymeric Hybrid Resists Imparts Better Resolution with Sensitivity for Next-Generation Lithography

2020 
Given the need for next generation technology node in the area of integrated circuits (ICs), improvement in the properties of resist materials particularly sensitivity (ED), resolution, good etch r...
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    41
    References
    3
    Citations
    NaN
    KQI
    []