Plasma Treatment Enhanced Magnetic Properties in Manganese Doped Titanium Nitride Thin Films

The ferromagnetic manganese doped TiN films were grown by plasma assisted molecular beam epitaxy on MgO(001) substrates. The nitrogen concentration and the ratio of manganese at Ti lattice sites increase after the plasma annealing post treatment. TiN(002) peak shifts toward low angle direction and TiN(111) peak disappears after the post treatment. The lattice expansion and peak shift are mainly ascribed to the reduction of nitrogen vacancies in films. The magnetism was suppressed in as-prepared sample due to the pinning effect of the nitrogen vacancies at defect sites or interface. The magnetism can be activated by the plasma implantation along with nitrogen vacancies reduce. The decrease of nitrogen vacancies leads to the enhancement of ferromagnetism.