Old Web
English
Sign In
Acemap
>
Paper
>
Study on layout dependence of soft errors in CMOS latch circuits fabricated by 65 nm CMOS process
Study on layout dependence of soft errors in CMOS latch circuits fabricated by 65 nm CMOS process
2006
H. Fukui
M. Hamaguchi
Hisao Yoshimura
H. Oyamatsu
F. Matsuoka
T. Noguchi
T. Hirao
H Abe
S. Onoda
Takeshi Wakasa
Hisayoshi Itoh
Keywords:
Semiconductor device
Bremsstrahlung
CMOS
Electromagnetic radiation
Materials science
Cyclotron radiation
Electronic circuit
Transistor
Cosmic ray
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]