A nozzle for distributing gas

PROBLEM TO BE SOLVED: To improve quality of depositing coatings by improving distribution homogeneity of a gas current feeding from a distributing nozzle used in deposition technique of CVD type. SOLUTION: A nozzle 1 for distributing precursor gases for coating onto a surface of a moving glass substrate 2 of a float glass belt type equipped with a gas feeding apparatus including a principal gas feed system 10 is equipped with an auxiliary gas feed system 15 independent of the principal gas feed system 10 for feeding at least one current of gases containing at least one of the precursor gases necessary to the formation of coating in the current or in the proximity of the principal gas. COPYRIGHT: (C)1996,JPO