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Change of ultraviolet-induced degradation resistance of CsLiB6O10 during the process of removing water impurities
Change of ultraviolet-induced degradation resistance of CsLiB6O10 during the process of removing water impurities
2019
Ryosuke Isokawa
Ryota Murai
Yoshinori Takahashi
Masayuki Imanishi
Masashi Yoshimura
Yusuke Mori
Keywords:
Photochemistry
Degradation (geology)
Ultraviolet
Nonlinear optics
Impurity
Materials science
Correction
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