Dependence of growth conditions on morphology in lateral epitaxial overgrowth of GaN by sublimation method

Abstract Lateral epitaxial overgrowth (LEO) of GaN by sublimation has been carried out to understand the dependence of growth conditions on the morphology and quality of the layers. Growth conditions have been optimised to have flat and smooth lateral overgrown surfaces with (1 1  2  0) stripe window opening. The changing feature from triangular stripe to rectangular stripe growth with change in growth temperature have been observed using scanning electron microscopy (SEM). Atomic force microscopy (AFM) result shows the dominance of step growth mechanism leading to two-dimensional growth in the lateral overgrown GaN layers.