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Process and Device Calibration for 31/51nm NMOS/PMOS Devices fabricated by Direct Write E-Beam
Process and Device Calibration for 31/51nm NMOS/PMOS Devices fabricated by Direct Write E-Beam
2002
Sheldon Aronowitz
Nicholas K. Eib
John Haywood
James Kimball
Mohammad R. Mirabedini
Helmut Puchner
Keywords:
NMOS logic
Calibration
PMOS logic
Materials science
Electron beam processing
Optoelectronics
Correction
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