Growth Kinetics and Characterization of Chromia Scales Formed on Ni–30Cr Alloy in Impure Argon at 700 °C

The oxidation of a Ni–30Cr alloy at 700 °C in impure argon was studied in order to provide new elements of understanding on chromia scale growth in low oxygen partial pressure atmosphere (10−5 atm). Oxidation tests were carried out during 30 min to 50 h in a thermogravimetric analysis system using a symmetrical balance with in situ monitoring of the oxygen partial pressure. The oxidation kinetics were determined as parabolic with an estimated stationary parabolic constant value of 10−15 cm2 s−1, after a transient stage of about 3 h. The oxide scale was identified as a pure chromia layer by TEM and XPS characterisations. After 50 h at 700 °C, the scale thickness estimated by TEM cross section observation was about 100 nm. A slightly thicker and more porous oxide scale was observed above the alloy’s grain boundaries. The metal/oxide interface also exhibited a deeper recession towards the substrate above the alloy’s grain boundaries. The orientation of chromia grains was determined by TKD (transmission Kikuchi diffraction). A strong preference was noted for the orientation perpendicular to the surface, along the direction of the corundum structure. Finally, the type of semiconduction was determined for the scales formed after 7 h and 50 h of oxidation. For the shorter oxidation time, the chromia scale exhibited an n-type semiconduction, whereas for the longer exposure, both n-type and insulating semiconduction were identified.