language-icon Old Web
English
Sign In

Seeded lateral epitaxial SOI using

1989 
Summary form only given. In addition to the traditional advantages of SOI devices, improved subthreshold slope, elimination of kink effect and enhancement in conductance have been reported for thin-film SOI devices. To achieve these characteristics, defect-free and orientation-controlled SOI is needed. In laser recrystallization using seeded lateral epitaxy, this has been achieved by
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    2
    Citations
    NaN
    KQI
    []