Process flow control method and system

The invention discloses a process flow control method. The method includes: judging whether the to-be-processed product wafer groups contain the product wafer groups which need a special process flow, and if not, processing the to-be-processed product wafer groups in batch according to a normal process flow; if so, setting the program of a public gear control piece as the program of a process machine in the special process flow, and using the public gear control piece to process the to-be-processed product wafer groups in batch. The invention further discloses a process flow control system using the method. By the process flow control method and system, semiconductor manufacturing automation control efficiency can be increased, misoperation is reduced, and production efficiency is increased.