The radiation-sensitive resin composition, the polymer and the resist pattern forming method

2011 
The present invention, [A] the same or different in the polymer, the polymer component having a structural unit (II) represented by the structural units (I) and the following formula represented by the following formula (1) (2) a [B] a radiation-sensitive acid generator, and [C] the radiation-sensitive resin composition containing a nitrogen-containing compound having a ring structure. In the following formula (1), Z is a group forming an alicyclic hydrocarbon group having divalent monocyclic ring with R R R In the following formula (2), X is a group forming an alicyclic hydrocarbon group having a bivalent bridged having 10 or more carbon atoms with R R R
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    0
    Citations
    NaN
    KQI
    []