Real-time variable-parameter micro-nano optical field modulation system and interference photoetching system

A real-time variable-parameter micro-nano optical field modulation system and an interference photoetching system. The optical field modulation system comprises a light source, a 4F optical system and an optical wave modulation optical component group, the 4F optical system comprises a first optical assembly (1) and a second optical assembly (2) sequentially arranged along an optical path, the optical wave modulation optical component group is arranged between the first optical assembly (1) and the second optical assembly (2), and the optical wave modulation optical component group generates an optical field distribution, adjustable in pattern and structural parameter, on a rear focal plane of the system by performing segment modulation on a sub wave front. The splitting of and real-time regulation for the sub wave front is realized by means of sub elements (13, 14, 23, 24, 27, 33, 34, 38, 43, 48, 53, 55, 56, 63, 64, 65, 66, 67, 68), a real-time output of different micro-nano patterns can be realized by changing a combination manner of the sub elements (13, 14, 23, 24, 27, 33, 34, 38, 43, 48, 53, 55, 56, 63, 64, 65, 66, 67, 68), and continuous modulation for structural parameters can be realized by means of a change in positions of the sub elements (13, 14, 23, 24, 27, 33, 34, 38, 43, 48, 53, 55, 56, 63, 64, 65, 66, 67, 68) or relative positions between the sub elements (13, 14, 23, 24, 27, 33, 34, 38, 43, 48, 53, 55, 56, 63, 64, 65, 66, 67, 68). The system can be flexibly integrated into various photoetching or microscopic systems so as to implement the real-time writing of a variable-parameter micro-nano structure, and optical detection of the micro-nano structure can be modulated.