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スズ貫通孔ターゲットを用いたレーザ生成プラズマEUV(Extreme Ultraviolet)光源
スズ貫通孔ターゲットを用いたレーザ生成プラズマEUV(Extreme Ultraviolet)光源
2009
nakano motohiro
mita yasuyuki
inoue haruyuki
osigane nei
kataoka tosihiko
Keywords:
Optics
Extreme ultraviolet
Nd:YAG laser
Tin
Materials science
Optoelectronics
X-ray laser
Extreme ultraviolet lithography
Correction
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