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ED2000-49 / SDM2000-49 酸素活性種を用いた極薄SiO_2膜の低温形成およびMOSFETゲート絶縁膜への応用
ED2000-49 / SDM2000-49 酸素活性種を用いた極薄SiO_2膜の低温形成およびMOSFETゲート絶縁膜への応用
2000
masahiko kanehiro
yasuyuki ueda
tune nobu kimoto
hiroyuki matunami
Keywords:
MOSFET
Electronic engineering
Materials science
Optoelectronics
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