The relationship between mounting pressure and time on final photomask flatness
2010
Photomask flatness and image placement specifications for advanced technology masks are becoming more
stringent. Therefore, it is important to understand the various factors that affect final photomask flatness due
to the direct impact it has on image placement. Past studies have demonstrated that final photomask flatness
can be controlled by modifying the mounting process of photomask pellicle as well as changing the pellicle
material itself [1][2][3][4]. In particular, our previous results demonstrate the ability to successfully eliminate
data deviations by remounting the same pellicle for each experiment. This paper focuses on the relationship
between mounting pressure and time on final photomask flatness. Our initial results indicate that mounting
time has minimal influence on final photomask flatness; however, final photomask flatness is greatly
impacted by varying mounting pressure. Finally we explore the relationship between the final photomask
flatness and the image placement for post pellicle mounting onto the photomask.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
1
Citations
NaN
KQI