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Relative influence of ion implantation mechanisms on optical recording properties of Te:He
Relative influence of ion implantation mechanisms on optical recording properties of Te:He
1989
J. Beauvais
P. Galarneau
Roger A. Lessard
Emile J. Knystautas
Keywords:
Ion implantation
Physics
Optoelectronics
Optical recording
Optics
Correction
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