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The Residual Stress and Al Incorporation of AlGaN Epilayers by Metalorganic Chemical Vapor Deposition
The Residual Stress and Al Incorporation of AlGaN Epilayers by Metalorganic Chemical Vapor Deposition
2018
Fangzheng Li
Lianshan Wang
Guijuan Zhao
Yulin Meng
Huijie Li
Yanan Chen
Shaoyan Yang
Peng Jin
Zhanguo Wang
Keywords:
Chemical vapor deposition
Materials science
Inorganic chemistry
Residual stress
Correction
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